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Please use this identifier to cite or link to this item: http://13.232.72.61:8080/jspui/handle/123456789/8987
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dc.contributor.authorV, Aishwarya-
dc.contributor.authorHaribal, Harsha P.-
dc.date.accessioned2025-03-17T06:41:42Z-
dc.date.available2025-03-17T06:41:42Z-
dc.date.issued2024-12-
dc.identifier.citationAishwarya, V. and Haribal, Harsha P. (2024) : UNNATA – Innovation in Industrial Architecture for Advanced Semiconductor Fabrication. 1-14p.en_US
dc.identifier.urihttp://13.232.72.61:8080/jspui/handle/123456789/8987-
dc.description1AA20AT06, Use only for academic purpose.en_US
dc.description.abstractUNNATA, focuses on designing an Outsourced Semiconductor Assembly and Testing (OSAT) facility that reflects my academic growth and aspirations as an architect. I aim to merge technical functionality with creative solutions, emphasizing the design of efficient, sustainable industrial spaces. UNNATA addresses the complexities of high-tech industrial architecture and embodies my commitment to creating innovative, inclusive, and sustainable environments that meet the evolving needs of technology and society.en_US
dc.language.isoenen_US
dc.publisherAcharya's NRV School of Architectureen_US
dc.subjectSustainable industrial spacesen_US
dc.subjectIndustrial architectureen_US
dc.subjectSemiconductor Assemblyen_US
dc.titleUNNATA – Innovation in Industrial Architecture for Advanced Semiconductor Fabricationen_US
dc.typeThesisen_US
Appears in Collections:BARC Project Reports 2024

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